Soil salinity is one of the abiotic constraints that imbalance nutrient acquisition, hampers plant growth, and leads to potential loss in agricultural productivity. Salt-tolerant plant growth-promoting rhizobacteria (PGPR) can alleviate the adverse impacts of salt stress by mediating molecular, biochemical, and physiological status. In the present study, the bacterium Bacillus mycoides PM35 showed resistance up to 3 M NaCl stress and exhibited plant growth-promoting features. Under salinity stress, the halo-tolerant bacterium B. mycoides PM35 showed significant plant growth-promoting traits, such as the production of indole acetic acid, siderophore, ACC deaminase, and exopolysaccharides. Inoculation of B. mycoides PM35 alleviated salt stress in plants and enhanced shoot and root length under salinity stress (0, 300, 600, and 900 mM). The B. mycoides PM35 alleviated salinity stress by enhancing the photosynthetic pigments, carotenoids, radical scavenging capacity, soluble sugars, and protein content in inoculated maize plants compared to non-inoculated plants. In addition, B. mycoides PM35 significantly boosted antioxidant activities, relative water content, flavonoid, phenolic content, and osmolytes while reducing electrolyte leakage, H2O2, and MDA in maize compared to control plants. Genes conferring abiotic stress tolerance (CzcD, sfp, and srfAA genes) were amplified in B. mycoides PM35. Moreover, all reactions are accompanied by the upregulation of stress-related genes (APX and SOD). Our study reveals that B. mycoides PM35 is capable of promoting plant growth and increasing agricultural productivity.

Optical emission spectroscopy of the active species in N 2 plasma is carried out to investigate their concentration as a function of discharge parameters such as filling pressure (2.0-7.0 mbar), source power (100-200 W) and gas flow rate (50-300 mg/min). The primary motivation of this work is to obtain reliable information about the concentration of the active species of N 2 plasma, which play an important role in plasma surface nitriding processes. Emission intensity from the selected electronic excited states of molecular and atomic species is evaluated as a function of discharge parameters to investigate their concentration. The emission intensity ratio I (N + 2 )/I (N 2 ) and I (N + )/I (N ) of the electronic transitions is also evaluated as a function of discharge parameters to investigate the relative dependence of their concentrations. It is observed that the concentration of the active species of N 2 plasma is strongly affected by the filling pressure and source power whereas flow rate has no significant effect. An increased occurrence of N + 2 molecular ions in comparison with N 2 molecules, and N + ions in comparison with N atoms is observed with source power whereas decreased occurrence of N + 2 molecular ions in comparison with N 2 molecules, and N + ions in comparison with N atoms is observed with the rise in filling pressure.

The room temperature nitriding of titanium is accomplished by utilizing nitrogen ion beams delivered by a 2.3 kJ plasma focus discharge. Titanium samples are exposed to ions at different axial positions (3, 5, 7 and 9 cm from the focus) in order to correlate their surface properties with ion beam parameters such as energy, number density, current density and energy flux (energy deliverance per unit time per unit volume). A BPX65 photodiode detector is employed to measure the ion beam parameters by using the time of flight technique. X-ray diffraction analysis as well as field emission scanning electron microscopy along with the energy dispersive x-ray spectroscopy is carried out to explore the structural, morphological and compositional profiles of the treated samples. The results demonstrate the formation of nanocrystalline TiN thin film with surface features strongly dependent on ion beam energy flux. A Vickers microindentation measurement reveals that the surface hardness is improved 4–5 times for typical nitrided samples.

No abstract

No abstract