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Two sets of modules have been sent around to different testing installations across Europe, one set to laboratories performing indoor calibrations and one set to laboratories performing outdoor power and energy ratings. The results show that for crystalline and polycrystalline devices, a very good agreement between laboratories has been achieved. A lower agreement between laboratories has been achieved for thin film devices and further need for research is identified.

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We present a novel fabrication process based on laser interference lithography, lift-off and reactive ion etching, which allows us to fabricate periodic nanostructures on photovoltaic substrates with an average root mean square (RMS) roughness of 750 nm. We fabricate nanostructures on unpolished crystalline silicon substrates, which reduces their reflectance 30% as fabricated. When an additional passivation layer is deposited, the light trapping grows, achieving a reflectance reduction of 60%. In addition, we have successfully integrated the nanostructured substrates in silicon wafer-based solar cells following standard processes, achieving a final efficiency of 15.56%.