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Ta 1-x Zr x N thin films were deposited by reactive magnetron sputtering aiming to investigate the influence of zirconium addition on the microstructure, hardness and high temperature oxidation resistance of the coatings. GAXRD showed that all Ta 1-x Zr x N thin films maintained ZrN crystalline structure, forming a TaZrN solid solution. Zr incorporation did not alter hardness values of Ta 1-x Zr x N coatings, however, promoted significant improvements in the oxidation resistance when compared to pure TaN thin films.