Robust superhydrophobic surfaces were synthesized as composites of the widely commercially available adhesives epoxy resin (EP) and polydimethylsiloxane (PDMS). The EP layer provided a strongly adhered micro/nanoscale structure on the substrates, while the PDMS was used as a post-treatment to lower the surface energy. In this study, the depositions of EP films were taken at a range of temperatures, deposition times, and substrates via aerosol-assisted chemical vapor deposition (AACVD). A novel dynamic deposition temperature approach was developed to create multiple-layered periodic micro/nanostructures that significantly improved the surface mechanical durability. Water droplet contact angles (CA) of 160° were observed with droplet sliding angles (SA) frequently <1°. A rigorous sandpaper abrasion test demonstrated retention of superhydrophobic properties and superior robustness therein, while wear, anticorrosion (pH = 1-14, 72 h), and UV testing (365 nm, 3.7 mW/cm, 120 h) were carried out to exhibit the environmental stability of the films. Self-cleaning behavior was demonstrated in clearing the surfaces of various contaminating powders and aqueous dyes. This facile and flexible method for fabricating highly durable superhydrophobic polymer films points to a promising future for AACVD in their scalable and low-cost production.

Low-cost, high-efficiency, and high quality Cl-doped ZnO (ZnO:Cl) thin films that can simultaneously function as transparent conducting oxides (TCOs) and photocatalysts are described. The films have been fabricated by a facile and inexpensive solution-source aerosol-assisted chemical vapor deposition technique using NH 4 Cl as an effective, cheap, and abundant source of Cl. Successful Cl O substitutional doping in the ZnO films was evident from powder X-ray diffraction, X-ray photoelectron spectroscopy, and time-of-flight secondary ion mass spectrometry results, while scanning electron microscopy reveals the impact of Cl doping on the ZnO thin film morphology. All ZnO:Cl films deposited were transparent and uncolored; optical transmittance in the visible region (400−700 nm) exceeded 80% for depositions using 5−20 mol % Cl. Optimal electrical properties were achieved when using 5 mol % Cl with a minimum measured resistivity of (2.72 ± 0.04) × 10 −3 Ω•cm, in which the charge carrier concentration and mobility were measured at (8.58 ± 0.16) × 10 19 cm −3 and 26.7 ± 0.1 cm 2 V −1 s −1 respectively, corresponding to a sheet resistance (R sh ) of 41.9 Ω□ −1 at a thickness of 650 nm. In addition to transparent conducting properties, photocatalytic behavior of stearic acid degradation in the ZnO:Cl films was also observed with an optimal Cl concentration of 7 mol % Cl, with the highest formal quantum efficiency (ξ) measured at (1.63 ± 0.03) × 10 −4 molecule/photon, while retaining a visible transparency of 80% and resistivity ρ = (9.23 ± 0.13) × 10 −3 Ω•cm. The dual functionality of ZnO:Cl as both a transparent conductor and an efficient photocatalyst is a unique combination of properties making this a particularly unusual material.

Cl-doped ZnO films, grown via aerosol-assisted CVD, can function as both TCOs and photocatalysts.