The temperature dependence of the resistivity of titanium oxynitride TiNxOy thin films with different oxygen and nitrogen content obtained by atomic layer deposition was investigated. We found that the resistance of all films monotonically decreased with increasing temperature and varied within a wide range depending on the chemical composition and thickness of the film. The technology for obtaining a compact temperature sensor of wide range from helium to room temperature based on 40 nm thick TiN0.87O0.97 is presented. Keywords: titanium oxide-nitride, temperature sensors, thin films, atomic layer deposition, integrated circuit components.