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Coating silicon dioxide on hydrothermally grown ZnO nanorods is demonstrated using a low temperature plasma enhanced chemical vapor deposition (PECVD) system. Wurtzite structured ZnO nanorods were prepared by spin coating ZnO nanocrystals onto plastics or glass substrates. Then, the nanorods were subsequently grown in a zinc nitrate solution. SiO2 was deposited by PECVD at 50 °C. No current could be measured through the patterned metal dots on the SiO2 coated sample, which indicates that SiO2 was covered seamlessly across the entire substrate. Photoluminescence measurements indicated that the SiO2 layer covering the nanorods did not alter the optical properties of the ZnO.

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