Resolution and brightness are the essential figure‐of‐merits for the microdisplay development needed for AR and VR applications. In this presentation, we show our technology development toward high‐resolution FMM‐free direct R‐G‐B OLED microdisplays. We show the schematic fabrication setup and integration route to fabricate red, green, and blue OLED pixels side‐by‐side by the OLED photolithographic patterning processes. We demonstrate a 1µm line and space feature with the photoresist and transfer the pattern to an OLED stack. With the high resolution of photoresist, high aperture ratio, and high‐resolution multicolor OLED pixel arrays are demonstrated. We also investigate the possible OLED degradations induced in the photolithography process. With the innovations in the process steps, OLED stacks, process environments, and photoresists, we demonstrate a breakthrough in the reliability of photolithography patterned OLED.

Resolution, power efficiency, and brightness are crucial features in microdisplays for upcoming VR and AR applications. This presentation shows our work towards a high‐resolution direct RGB microdisplay. An IGZO TFTs with a top gate length of 80 nm is realized with 300mm facilities for high‐resolution backplane developments. For the development of high‐resolution OLED enabled by photolithographic patterning, we investigate an excess driving voltage in photolithographic patterned OLEDs caused by contaminants at the organic semiconductor interface. With necessary mitigation, we reduce the excess driving voltage and observe no significant lifetime change after multiple photolithographic patterning steps.