Functionalized graphene has been extensively studied with the aim of tailoring properties for gas sensors, superconductors, supercapacitors, nanoelectronics, and spintronics. A bottleneck is the capability to control the carrier type and density by doping. We demonstrate that a two-step process is an efficient way to dope graphene: create vacancies by high-energy atom/ion bombardment and fill these vacancies with desired dopants. Different elements (Pt, Co, and In) have been successfully doped in the single-atom form. The high binding energy of the metal-vacancy complex ensures its stability and is consistent with in situ observation by an aberration-corrected and monochromated transmission electron microscope.

In the present work, taking advantage of aberration-corrected scanning transmission electron microscopy, we show that the dynamic lithiation process of anode materials can be revealed in an unprecedented resolution. Atomically resolved imaging of the lithiation process in SnO2 nanowires illustrated that the movement, reaction, and generation of b = [1[overline]1[overline]1] mixed dislocations leading the lithiated stripes effectively facilitated lithium-ion insertion into the crystalline interior. The geometric phase analysis and density functional theory simulations indicated that lithium ions initial preference to diffuse along the [001] direction in the {200} planes of SnO2 nanowires introduced the lattice expansion and such dislocation behaviors. At the later stages of lithiation, the Li-induced amorphization of rutile SnO2 and the formation of crystalline Sn and LixSn particles in the Li2O matrix were observed.

Doping nanostructures is an effective method to tune their electrical and photoelectric properties. Taking ZnO nanowires (NWs) as a model system, we demonstrate that atomic layer deposition (ALD) can be adopted for the realization of a doping process by the homo-epitaxial growth of a doped shell on the NW core. The Al-doped ZnO NWs have a layered superlattice structure with dopants mainly occupying the interstitial positions. After annealing, Al(3+) ions diffuse into the ZnO matrix and occupy substitutional locations, which is desirable for dopant activation. The stress accumulated during epitaxial growth is relaxed by the nucleation of dislocations, dislocation dipoles and anti-phase boundaries. We note that the proposed method can be easily adopted for doping different types of nanostructures, and fabricating superlattices and multiple quantum wells on NWs in a controllable way.

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