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A hybrid plasmonic waveguide with a metal cap on a silicon-on-insulator rib (or slab) is presented. There is a low-index material nano-layer between the Si layer and the metal layer. The field enhancement in the nano-layer provides a nano-scale confinement of the optical field (e.g., 50 nm x 5 nm) when operates at the optical wavelength lambda = 1550 nm. The theoretical investigation also shows that the present hybrid plasmonic waveguide has a low loss and consequently a relatively long propagation distance (on the order of several tens of lambda).

We characterize an approach to make ultra-low-loss waveguides using stable and reproducible stoichiometric Si3N4 deposited with low-pressure chemical vapor deposition. Using a high-aspect-ratio core geometry, record low losses of 8-9 dB/m for a 0.5 mm bend radius down to 3 dB/m for a 2 mm bend radius are measured with ring resonator and optical frequency domain reflectometry techniques. From a waveguide loss model that agrees well with experimental results, we project that 0.1 dB/m total propagation loss is achievable at a 7 mm bend radius with this approach.

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