The problem of quantifying LER in the semiconductor industry has become critical with sub-lOOnm node manufacturing. However, routine methods for LER measurement to meet the needs of industry have not been reported. Even the definition for LER has not been defined unambiguously. Also, the length ofthe photoresist structure, on which LER is measured, has not been standardized.Meanwhile, demands for precision in LER calculations have been put forward without accounting for the statistical nature of this parameter. In addition, the algorithms used for feature edge localization when performing LER measurements frequently have free parameters [1] which makes LER estimation ambiguous and does not allow LER comparisons of the same feature. In particular, without taking into account the influence of signal noise in the SEM video, the LER measurements obtained will have contributions from both the measured feature and measuring tool (SEM). The manner in which this measurement is done results in LER values that exceed the true LER. Moreover, when measured objects have aspect ratios exceeding three, it is not clear where along the cross-section height of the object-bottom, top, or some intermediate position-correspond to the measured values. The above issues make the interpretation of obtained results very difficult, and significantly reduces the reliability and value of LER measurement results present in the referenced literature.Nanometrology has developed a new concept for LER measurements that is free of many of the disadvantages mentioned above. It is based on the definition ofLER as "a standard deviation ofthe factual edge position on SEM scan lines from an approximated straight line". Nanometrology's use of a patented algorithm for edge localization of 3D objects results in the measurement of the bottom CD of photoresist structures. Our algorithms do not have free parameters. These algorithms have been incorporated into a CD measurement software package called CD-LER.

No abstract

The problem of enacting an effective Advanced Process Control (APC) system is herein discussed [1]. The schematic structure of the system is represented below: Lithography, Technology Photomask Design Process Engineering Technology SEM Metrology CD/LER/LWRThe creation of such a system with a communication link between the mask designer and lithography and process engineering of consequent operations can be broken down into two problems:1. Organization of the interaction of services performed by APC 2. Reliability of the measurement information obtained in SEM CD metrologyWe will focus on the second problem. The effectiveness of the operation of the APC system depends on the reliability (precision and accuracy) of the measurement outcomes.

The pitch ofa Hitachi Standard Micro Scale was measured using NanoCaP' and a LEO 1560 SEM. The pitch pedigree and certification were intentionally withheld from Nanometrology team members to enable independent measurement and certification ofan unknown Hitachi Micro Scale standard during this work. NanoCal' allows one to achieve pitch measurements with sub-nanometer accuracy and precision as well as to perform SEM magnification calibration with the precision and accuracy required for sub 9Onm SEM metrology.

The State Agrarian University of the Northern Trans-Urals continues to breed spring wheat. Two varieties of Tyumen Jubilee and Tyumenochka have been created with the use of various source materials, including sources to the main cultural diseases in the region. Tyumenskaya variety has passed the State Variety Testing and is included in the Register of breeding achievements in 10 regions. The second variety is in the State Variety Trial. Research is continuing on both varieties to develop seed varieties. The results of influence of different levels of mineral nutrition on yield and quality of seeds of wheat varieties are analyzed in this report. It is established that in the northern forest-steppe zone of the Tyumen region on the natural fertility of leached black soil the average seed yield for three years was for the variety Tyumenskaya jubilee 2.48 t/ha, for Tyumenochka – 2.08 t/ha. In the variant with application of mineral fertilizers to the planned yield of 4 t/ha, the first grade seed was obtained 3.29 t/ha, the second – 2.91. The additions to the control variant were 0.81 and 0.83 t/ha. When applying mineral fertilizers to the yield of 5 and 6 t/ha, the additions remained at the level of the previous version, except for the Tyumenochka variety in the last version. The yield of seeds from the total yield in the control variant was 75.5 % for the variety Tyumenskaya jubilee and 71.7 % for Tyumenochka. In the variant with NPK by 4 t/ha the yield of seeds increased by 4.2 % in the first grade and by 4.5 % in the second grade. Protein content in the seeds of wheat varieties on the natural soil fertility was 13.6 and 12.3 %, respectively. The maximum content of 16.0 and 14.8 % is noted in the variant with fertilizers for the planned yield of 4 t/ha. In the same variant the highest germination energy (82.3, 80.1 %) and germination of seeds (96.9 and 95.5 %) are higher than the control variant by 20.7, 15.6 and 1.8 %; 2.5 % accordingly. The main part of the seeds (71.0 and 68.1 %) of the studied wheat varieties in the mentioned variant grew with 5–6 germ roots that is 19.3 and 13.2 % higher than the control. The variant with fertilizers for the planned yield of 4 t/ha was more economically advantageous, the level of profitability of the variety Tyumenskaya jubilee was 49 %, and Tyumenochka 44 %.