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TiO2 films have been deposited on indium tin oxide covered glass. These substrates are immersed in a flowing aqueous solution containing a soluble titania precursor. TiO2 growth is activated by microwave (MW) radiation heating. This method produces transparent and well-adhered films at low temperatures (lower than 100 °C) and short times. Flowing the precursor solutions allows growth of titania films on the substrate and avoids titania powder precipitation in the solution. It is demonstrated that thickness and crystallinity are controlled through MW power, process time, and precursor choice.