No abstract

Al-containing hydrogenated amorphous carbon (Al–C : H) films were deposited on silicon substrates using a mid frequency magnetron sputtering Al target in an argon and methane gas mixture. The composition, surface morphology, hardness and friction coefficient of the films were characterized using x-ray photoelectron spectroscopy, atomic force microscopy, nanoindentation and tribological tester. The Al–C : H films deposited at low CH4 content show high surface roughness, low hardness and high friction coefficient, similar to metallic Al films; in contrast, the Al–C : H films prepared under high CH4 content indicate low surface roughness, high hardness and low friction coefficient, close to that of hard a-C : H films as wear-resistance films.