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Induction -coupled plasma deposition (JCPD) is currently a laboratory process relying on operator expertise rather than automated control. In telligent process con· trol for the lCPD process, which consists of integration of processing knowledge, process models, process sellsors and control technology, offers the opportunity to provide closed-loop control as well as intelligent supervisory control to accelerate process development and bring the lCPD process to fullscale productIOn. Intelligent process control for lCPD offers benefits such as higher maferial quality, control of the matrix microstructure, cost reduction, higher process yield, and shorter development and production cycle times.