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anoimprint ithography is a technology which has been developed during the last decade for achieving stmctnres in the nanometer range. The authon show a short overview of the mainstream processes and work out the advantages of the tep and Flash Imprint ithography -FI . rocess results reached at olecular Imprint Inc.11, ustin, Te as, confirm this theses. comparison is done hetween optical lithography and the dillerent imprint techniques. ereby -FI is the most amactive technology enabling low cost lithography m the nanometer range. Inder Termsan0 imprint lithography, -FI , mulB layer processing, ne t generation lithography

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