No abstract

Impurity-free, polycrystalline films of platinum have been grown by the decomposition of cyclopentadienyl platinum trimethyl, CpPtMe3, in hydrogen and a noble gas over silicon or glass substrates heated to 180 °C. The films contain less than 1 at. % of oxygen and carbon, and no other detectable impurities, as measured by x-ray photoelectron and Auger spectroscopies after argon ion sputtering. Sheet resistivities are 50% greater than sputter-deposited platinum.

No abstract

No abstract

No abstract