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TiO2-nanoparticle-dispersed resin was prepared to form various nanoscaled structures using UV nanoimprint lithography (UV NIL). This resin-made of TiO2 nanoparticles, a monomer, solvent, and UV initiator-showed variations in refractive index depending on the nanoparticle concentration. TiO2 nano-to-microscale patterns were fabricated on various substrates such as Si wafer and glass, and even on flexible substrates, by using UV NIL, which offers advantages such as low cost, large area, and high throughput. Low-aspect-ratio, high-aspect-ratio, and microconvex patterns were fabricated using the NIL process. The optical properties of the patterns were analyzed using UV-vis spectrophotometry.

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