Articles you may be interested in3D proximity effect correction based on the simplified electron energy flux model in electron-beam lithography Proximity effect correction using pattern shape modification and area density map Dose, shape, and hybrid modifications for PYRAMID in electron beam proximity effect correction
The purpose of this study is to present an "environmental catalyst" possessing both thermocatalytic activity and visible-light activity for the decomposition of organic pollutants. Molecule-sized MnO x clusters are highly dispersed on the surface of TiO 2 (anatase/rutile = 4/1 w/w, P-25, Degussa) by the chemisorption-calcination cycle technique using Mn(acac) 3 complex as a precursor (MnO x /TiO 2 ). The thermo-and photo-catalytic activities of MnO x /TiO 2 were studied for the degradation of 2-naphthol used as a model water pollutant. In contrast to the FeO x /TiO 2 system, MnO x /TiO 2 exhibits high thermocatalytic activity exceeding those of bulk β- β-MnO 2 and Mn 2 O 3 . Also, visible-light activity is induced by the surface modification of TiO 2 with MnO x clusters, whereas its UV-light activity decreases.
A method has been developed for correcting line width variations due to midrange flare with a scattering range of over a few tens of micrometers (which we call local flare). It is shown that the conventional single Gaussian point spread function (PSF) is not sufficient and that a double Gaussian point spread function is needed to explain the line width variation caused by local flare. The remaining errors after correction are discussed under the assumptions that the mask correction is linear with respect to local flare intensity and is independent of pattern layout considering the order of the local flare correction (LFC) and optical proximity correction (OPC). This simple sizing method can reduce the critical dimension (CD) variation regardless of whether LFC is done before or after OPC. The LFC performance was evaluated using actual 90-nm-node LSI data. A much faster correction time than that of OPC was achieved by introducing the area density map method. The CD variation due to local flare was reduced from 22 to 5 nm.
Articles you may be interested inTwo-dimensional ultrashallow junction characterization of metal-oxide-semiconductor field effect transistors with strained silicon
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