The dielectric properties show a typical ferroelectric relaxor behavior in CaCu3Ti4O12 ceramics with different grain sizes in the temperature range of 400–600K. The relaxation strength and the frequency dispersion increase with grain size decreasing, which can be due to the different stresses in grains with different sizes. These variations have been confirmed by the modified Curie-Weiss law. The results fitted well by the Volgel-Fulcher relationship and the variations in the slim current-voltage loops are correlated with the microstructures closely. It can be proposed that the grain size is one of the main factors of affecting the relaxor behavior.

In this work, benzocyclobutene‐introduced poly(silmethylene)s were synthesized by ring‐opening copolymerization of benzocyclobutene (BCB) functionalized disilacyclobutene with phenyldisilacyclobutene. The incorporation ratio of BCB was tailored by changing feeding ratio of 1,3‐dimethyl‐1,3‐dibenzocyclobutene‐1,3‐disilacyclobutane and 1,3‐dimethyl‐1,3‐diphenyl‐1,3‐disilacyclobutane, thus enabling the control of ultimate properties of cured resins. With increasing the incorporation ratios of BCB from 9.5 to 28.9 mol%, T5% of cured resins is improved from 404°C to 462°C, while the dielectric constant is decreased from 2.59 to 2.41 at 10 MHz. The excellent thermal stability and low‐dielectric performance make such thermosets potential inter‐layered or inter‐lined low‐dielectric media. Copyright © 2017 John Wiley & Sons, Ltd.

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Low dielectric photopatternable materials have aroused much interest owing to their potential application as alternatives of conventional photoresists. Although a number of photosensitive groups have been established to construct photopatternable materials for many years, it is still a challenge to introduce them into polymer chains via a facile and control polymerization technique, such as living free radical polymerization. In this work, on the basis of the photoactive silaycyclobutene moiety, a new monomer, 1‐methyl‐1‐(4‐vinylphenyl) silacyclobutane (1‐MVPSCB), was synthesized and demonstrated successful to conduct atom transfer radical polymerization (ATRP). Subsequently, the copolymerization of 1‐MVPSCB with 4‐vinylbenzocyclobutene (4‐VBCB) and styrene produced a kind of benzocyclobutene/silacyclobutane double‐crosslinked polymer (BS‐DCP) with controlled benzocyclobutene/silacyclobutane ratios and low polydispersity index. Owing to the UV/thermally dual crosslinked structure, BS‐DCP possesses photapatternability, high dimensional stability and low dielectric constant (2.37 at 10 MHz). These properties make BS‐DCP a potential photoresist that could be directly used as interconnected dielectrics. © 2017 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2017, 55, 1920–1928

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