Straight and well‐aligned GaN nanorods have been obtained by horizontal hydride vapor phase epitaxy (HVPE) at a relatively low temperature (∼ 480 °C). This catalyst‐ and template‐ independent method involves the controllable growth of GaN nanorods on a sapphire substrate, with the rods preferentially oriented along the crystal c‐axis. The Figure shows a cross‐sectional SEM image of the GaN nanorods.
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