This article describes the creation and study of high quality reliefs and stamps. The thickness of the relief is 40 nm. The created nanoreliefs were investigated by optical and atomic force microscopy. Several methods have been tested for their creation: dry etching, nanolithography and nanoprinting. The developed technology for the transfer of nanoreliefs on various surfaces is distinguished by the obtained high resolution about 10 nm and low energies of the used electron beam 1-150 μC/cm2. The obtained finished reliefs can be used in mints in the form of a high level security holograms, in photolithography for the manufacture of masks, in the creation of rainbow holograms, holographic gratings.