The oxidation behavior of the silicon yttrium oxynitride Y,,Si,O,,N,, so-called H-phase, in the temperature range 700-1400°C has been investigated. A nitrogen retention phenomenon in the oxidation product Y4,67(Si04)30 (0-apatite) is discussed. The H-phase is one of the four quaternary compounds identified in hot-pressed Si,N, materials fabricated within the Si,N,-SiO,-Y,O, pseudoternary system.
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