The NSLS-II [1] program has a requirement for an unprecedented level of x-ray nanofocusing and has selected the wedged multilayer Laue lens [2,3] (MLL) as the optic of choice to meet this goal. In order to fabricate the MLL a deposition system is required that is capable of depositing depth-graded and laterally-graded multilayers with precise thickness control over many thousands of layers, with total film growth in one run up to 100μm thick or greater. This machine design expounds on the positive features of a rotary deposition system [4] constructed previously for MLLs and will contain multiple stationary, horizontally-oriented magnetron sources where a transport will move a substrate back and forth in a linear fashion over shaped apertures at well-defined velocities to affect a multilayer coating.

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