The fabrication of kinoform micro-optical elements for applications in optical computing is described. The elements are recorded as continuous microrelief structures by programmable laser beam writing in photoresist with a computer-controlled precision xy stage and a modulated, focused laser beam. Kinoform structures can be programmed to any desired profile that is required for reproducing complex, optimized structures that are found by computer design techniques.

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A 3.75µm back-illuminated voltage-domain global shutter pixel is presented. The 10T pixel architecture presented contains two independently operable storage branches and supports dual-capture, HDR and CDS functionality. Electronic shielding of the sample diffusions by the vertical photodiode is utilised to reach native and differential parasitic light sensitivities below-73.5dB and-82.5dB at 940nm respectively. A global shutter HDR image capture mode with minimal motion artefacts is also demonstrated.

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