Aim To examine the longitudinal trajectory of intrinsic capacity over a 3‐year period among long‐term care recipients in Taiwan, its association with functional decline and the onset of severe dependency. Methods A total of 9448 individuals aged ≥50 years utilizing home and community‐based long‐term care services with complete data from three separate evaluations in Taiwan were included in the study. We carried out a latent class linear mixed model to identify heterogeneous patterns of intrinsic capacity over time, a mixed‐effects model to investigate their impact on activities of daily living and a Kaplan–Meier analysis to examine the onset year of severe dependency among different intrinsic capacity classes. Results The results identified four classes sharing similar longitudinal the intrinsic capacity trajectories: “high‐stable” (20.13%), “normal‐stable” (40.58%), “sensory‐dysfunction” (29.53%) and “all‐dysfunction” (9.76%). Individuals with predisposing characteristics were associated with lower activities of daily living, with the exception of age and education level. In addition, the poor intrinsic capacity class (b from −16.94 to −6.61, P < 0.001) had a worse evolution in terms of activity of daily living scores, and was associated with an earlier onset of severe dependency in 2.5 years in the all‐dysfunction class. Conclusions Heterogeneous patterns of intrinsic capacity that delay further functional decline are promising markers of function trajectories for a person‐centered care approach in long‐term care services. Targeting the needs of intrinsic capacity groups to prevent functional decline offer insights into: (i) strengthening function‐centered care modalities to delay severe dependency as individuals get older; and (ii) validating regular monitoring intrinsic capacity as an early warning system to achieve healthy aging. Geriatr Gerontol Int 2022; 22: 516–522.

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Native defects in mask blanks is one of the key issues in extreme ultraviolet lithography. If defect-free mask blanks is the only solution, the resulting cost will be very high due to the low yield of such blanks. In this paper, we present a method for fabricating defect-free-like EUV masks by implementing several novel techniques such as global pattern shift, fine metrology-orientation and precise e-beam second-alignment from blank preparation to e-beam exposure. The mitigation success rate versus mask pattern density is simulated and verified by lithographic results using mitigated masks.Our methodology provides a way to achieve defect-free-like EUV mask blanks.