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We have designed, constructed, and are now performing experiments with a proof-of-concept projection electron-beam iithography system based upon the SCALPEL® (SCattering with Angular Limitation Projection Electron-beam Lithography) principle. This initial design has enabled us to demonstrate the feasibility of not only the electron optics, but also the scattering mask and resist platform. In this paper we report on some preliminary results which indicate the lithographic potential and benefits of this technology for the production of sub-0. 18 .tm features

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