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Abstract. TiAlN was sputtered reactively by HIPIMS in the target compositions Ti/Al 33/67 and 50/50 using a modified OC Oerlikon Balzers INNOVA coating equipment. The resulting film properties like deposition rate, surface roughness, hardness, Young's modulus, wear, and film stress were analyzed as function of the nitrogen gas flow, pressure, target-substrate distance, and substrate bias. Furthermore, the films were characterized by X-ray diffraction and secondary electron microscopy of the cross section and the surface appearance. The process characteristics and film properties were compared with pulsed DC sputtering under the same conditions.