The direct current (DC) reactive magnetron sputtering of a metal copper target in oxygen-argon mixed atmospheres to produce thin films of crystalline copper oxides was described. The sputtering pressure, sputtering power and oxygen flow rate were established in order to control the structures and properties of Cu2O films. The as-deposited Cu2O films with various crystal structures have high visible absorption and photo-catalytic activity under visible light irradiation. The photo-catalytic properties of Cu2O films are affected by not only the crystal structure but also the surface morphology.
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