Objectives: To study the influence of deposition time on the physical behavior of NiS films formed by chemical bath deposition (CBD). Methods: Polycrystalline NiS thin films were deposited by using CBD method on glass substrates by varying the deposition time in the range of 60-150 min with the other growth conditions kept constant. The physical properties were measured using an X-ray diffractometer, Scanning Electron Microscopy with Energy Dispersive X-ray analyzer, and Fourier transform infrared spectra. Finally, the optical and electrical properties of the films were analyzed by using UV-Vis spectrophotometer and linear four-probe point method respectively. Findings: The X-ray Diffraction (XRD) studies showed polycrystalline nature of the films with hexagonal structure, confirmed by the Rietveld refinement analysis. The calculated crystallite size varied from 6 nm to 19 nm with the increase in deposition time. The EDS analysis revealed the stoichiometry of Ni and S in the samples. The optical bandgap decreases from 2.06 eV to 1.93 eV with the increase in deposition time. The films synthesized using a deposition time of 120 min at 80 • C showed a high electrical conductivity of 48.3 S/cm at room temperature with activation energy of 0.16 eV. Novelty: NiS thin films were deposited by the CBD method using different deposition times varying from 60 min. to 150 min., keeping the bath temperature constant at 80 • C for the first time. The Rietveld refinement analysis was the first of its kind, reported on the structural evaluation of NiS layers. These films were formed using eco-friendly materials adding value to the solar cell application.