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Long term thermal stability of the amorphous R-T films is a fundamental requirement for the sake of practical use. Detailed experiments of the annealing effects were made on the amorphous GdCo, GdFe, and GdCoMo films prepared by means of the D.C. biased r.f. sputtering technique. It is found that annealing at various temperatures reduces Ku, but it enhances Ms and A in all of the films. Moreover, it is found also that the changing rates of Ms and Ku decrease with the increase of Mo concentration in the amorphous GdCoMo films.

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