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has been change from 0.4 μm to 0.2 μm. And nano-size PSSs (NPSS) also are reported widely [8]. In addition, PSS with a variety of complicated shapes such as crown pattern [9], volcano pattern [10][11][12] and micro/nano-scale hybrid pattern [13,14], can be fabricated through different processes methods. LEEs of a GaN-based LED grown on these complicated PSSs are better than that grown on a common cone-shaped PSS due to better scatter efficiency. For volcano-shaped PSS, various fabrication processes are utilized including nanosphere lithography [12], twice conventional overlay lithography [11] and nanoimprint lithography [19]. However, nanosphere lithography has poor repeatability and thus is difficult to apply in large scale wafers. Twice conventional overlay lithography requests additional overlay exposed process and is difficult to operate under a sub-micro scale. Nanoimprint lithography is a large scale method, but the equipment is expensive