Inert weakly coordinating carborane anions, CB11H6X6 - (X = Cl, Br), allow access to the long sought, highly electrophilic diethylaluminum moiety in Et2Al(CB11H6X6). X-ray crystallography reveals ion-like structural features reminiscent of the corresponding trialkylsilylium species. Et2Al(CB11H6X6) is a potent catalyst for the electrophilic ethenation of benzene, the polymerization of cyclohexene oxide, and the oligomerization of ethene to a low molecular weight, highly branched product.

Thin films of tungsten nitride were deposited from Cl 4 (CH 3 CN͒W͑N i Pr) by metallorganic chemical vapor deposition ͑MOCVD͒ in the presence and absence of ammonia (NH 3 ) coreactant. Films were analyzed by X-ray diffraction, Auger electron spectroscopy, and X-ray photoelectron spectroscopy ͑XPS͒. Films grown with NH 3 had increased nitrogen levels and decreased carbon and oxygen levels relative to films grown without NH 3 over the entire deposition temperature range ͑450-700°C͒. Deposition with NH 3 at higher temperature ͑у600°C͒ led to higher crystallinity. Binding energies from XPS measurements were consistent with the formation of WN x ͑or WN x C y ) and WO 3 in the films, regardless of whether NH 3 was present. The addition of NH 3 at lower deposition temperature increased film resistivity significantly.