A novel palladium(II)/copper(II)‐catalyzed sulfidation of the C–H bond in electron‐rich arenes and in pentafluorobenzene with disulfides was developed. This catalytic system can be used to efficiently produce various types of either unsymmetrical aryl sulfides or alkyl aryl sulfides. The present protocol could also be applied to the direct preparation of unsymmetrical aryl selenides via C–H selenation.

A protocol for the direct preparation of dibenzothiophenes from 2‐biarylyl disulfides in the presence of an economic and ecological oxidant, molecular iodine, was explored. This protocol was used for the direct preparation of dibenzoselenophene.

In this study an InI-TMDS (1,1,3,3-tetramethyldisiloxane) reducing system effectively catalyzed the reductive dithioacetalization of a variety of aromatic and aliphatic carboxylic acids with 1,2-ethanedithiol or 1,3-propanedithiol leading to the one-pot preparation of either 1,3-dithiolane derivatives or a 1,3-dithiane derivative. Also, the intact indium catalyst continuously catalyzed the subsequent oxidative desulfurization of an in situ formed 1,3-dithiolane derivative, which led to the preparation of the corresponding aldehydes.

It is very important in the design of positive-type resists to consider the dissolution inhibition effect to form high-resolution patterns. Previously, the phenomenon of the inhibition of hexafluoroisopropylalcohol-containing polystyrene's dissolution into alkaline developers by sulfonium salt photochemical acid generator (PAG) was studied. In the present study, patterning was conducted to examine whether the above platform can be applied to positive-type resists. As a result, the platform was found to be useful for the formation of resist patterns and be a novel non-chemically amplified resist. On the other hand, a decrease in sensitivity was observed with an increase in the amount of PAG to enhance the dissolution inhibition effect, and an increase in the amounts of residues derived from decomposition products of PAG occurred by making the resist films thinner to improve the sensitivity. It was suggested that enhancement of the interaction and light transmittance by changing polymer compositions and structures of PAG and improvement of miscibility of PAG with alkaline developers might be effective. This resist system is expected to be one of the platforms as a solution when resist materials with nearly critical dimensions for which chemically amplified type cannot be applied are required in the future. K E Y W O R D Sphotoresists, dissolution inhibition effect, fluoropolymers, photochemical acid generator, interaction

Described herein is a direct approach to symmetrical thioethers from either aromatic carboxylic acids or aromatic aldehydes with elemental sulfur (S8) by using a reducing system combined with InI3 and 1,1,3,3‐tetramethyldisiloxane (TMDS). This sulfidation does not require functionalized sulfur reagents, such as sulfides, disulfides, or metal sulfides, and it simultaneously forms two carbon–sulfur bonds in a single catalytic system.