Purpose To compare refractive and biometric outcomes in patients with type 1 retinopathy of prematurity (ROP) treated with intravitreal injection of ranibizumab (IVR) versus bevacizumab (IVB), at a corrected age of 3 years. Methods A retrospective case series compared cycloplegic refractive statuses and biometric statuses in patients who received either IVR or IVB for type 1 ROP, from April 2011 to April 2014. Results A total of 62 eyes (33 patients) with type 1 ROP were evaluated (26 eyes in 13 IVR patients and 36 eyes in 20 IVB patients). There were no differences in birth statuses including gestational age and birth body weight between the two groups. The prevalence of refractive error greater than 1 D was higher in the IVB group (p = 0.03), and there was a higher prevalence of high myopia (<−5.0 D, p = 0.03) in the IVB group. Comparisons in biometric finding showed that IVB patients had shallower anterior chamber depth (p = 0.01). Conclusion Both IVR and IVB showed low refractive errors, even followed at the corrected age of 3 years. No difference was noted between the two groups in refractive statuses. However, IVB was associated with shallower anterior chamber and higher prevalence of refractive error at the corrected age of 3 years. This trial is registered with NCT03334513.
Titanium oxide (TiO2) thin films were prepared by ion-assisted deposition (IAD) on glass substrates at various substrate temperatures. These films were re-baked and at the temperature of re-crystallization. The effects of the stability of the films on their optical properties, residual stress and surface roughness were studied. The evolution of oxidation and the cause of the variation in the optical properties and residual stress during baking and re-baking were discussed. However, the optical constants, residual stress and surface roughness varied less in re-baking than in baking. During both baking and re-baking, at substrate temperatures of 150 °C, the extinction coefficients, residual stress and surface roughness fluctuated more than at substrate temperatures of 200 and 250 °C. These results all reveal that TiO2 films were more stable after re-baking than after baking, and it was especially useful for the IAD films deposited at substrate temperature of 150 °C.
Aluminum nitride films were deposited by alternating-current dual reactive magnetron sputtering. The influence of different nitrogen flow and working pressures at a sputtering power of 5 kW on the refractive index, extinction coefficient, crystalline structure, residual stress, and surface roughness of aluminum nitride films was discussed. The aluminum nitride film would have high refractive index, low extinction coefficient and small residual stress at suitable nitrogen flow rate and low working pressure.
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