This work reports the influence of gas mixing ratio on the normalCl2∕Ar , normalCl2∕He , and normalCl2∕normalN2 plasma parameters, steady-state densities, and fluxes of active species in the planar inductively coupled plasma reactor. The investigation combined plasma diagnostics by Langmuir probes and quadrupole mass spectroscopy with a global (zero-dimensional) plasma model. It was shown that the dilution of Cl2 by any additive gas results in a noticeable change in both the electron temperature and density, as well as provides the acceleration in the electron impact dissociation kinetics of Cl2 molecules. No qualitative differences for the given three systems in regard to relative changes in active species densities and model-predicted etch rate behaviors were obtained.

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Low cost submicron patterning technique to fabricate a large area polymeric replica mold using an ultraviolet nanoimprint lithography (UV-NIL) technique is reported. A photo-curable polyurethaneacrylate (PUA) precursor was densified via UV light in order to form a solid polymeric replica mold and to maximise its stability, yet stable mechanical properties with different UV-exposure times were studied using a nanoindentation method as a function of the penetration depth during the loadingunloading cycles. The PUA replica mold demonstrated very high mechanical properties of hardness (0.15 GPa) and elastic modulus (2.7 GPa) due to the increased cross-linking density of the PUA precursor at an optimized UV-exposure time of 600 s. The PUA replica mold demonstrated potential for the fabrication of multi-scale line-and-space patterns with sizes of 350 nm or less with good uniformity and reproducibility over large areas. The replication of the polymeric mold with high durability and excellent mechanical properties can be economically valuable to physical contact nanolithography processes for the high throughput fabrication of micro-and nanodevices.

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