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We have used silicon and glass as substrate for gold and platinum thin films deposition. The film thickness are between 40 and 440 nm for gold and between 26 and 220 nm for platinum. We have analyzed these samples by scanning tunneling microscopy and by X ray diffraction. The crystallographic and morphological grain sizes are discussed.1.

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We have uniformly coated the cantilever of an atomic force microscope (AFM) with gold thin films. These films are nanostructured with thickness going from 19 to 62 nm. The resonance frequencies of this cantilever have been measured, before and after the Au coatings. Taking into account these frequencies and the vibrating beam theory, we determined the Young modulus of the Au films, obtaining E2 = 69.1 ± 2.6 GPa , i.e. about 12% lower than the respective bulk elastic modulus.

We have fabricated platinum thin films by metal plasma ion deposition on silicon substrates. The roughness of these films has been measured by a scanning tunneling microscope (STM) and we have determined the growth dynamics critical exponents.