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Experimental studies are made on the effect of hydrogen, boron ions, electrons, and γ‐irradiations on thermal stability of amorphous electrodeposited Co‐based films using X‐ray diffraction, transmission electron microscopy, and magnetic measurements. It is found that all the types of irradiations mentioned above result in a deterioration of the thermal stability of the amorphous state. Under definite conditions of hydrogen ion irradiation the effect of irradiation‐induced crystallization of the CoP alloy films is observed. It is assumed that the irradiations studied increase the short‐range order in the atomic arrangement of amorphous electrodeposited films, resulting in the activation of the crystalline phase nucleation process.