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We present a method for component-centric modeling of silicon nanophotonics, where a closed optimization loop allows to take the effects of the fabrication process into account during the design of nanophotonic components. This enables black-box component descriptions with functional parameters. Underlying mask layouts of the components can then automatically be optimized for their actual performance, and not just for their geometric layout. To simulate the effect of fabrication, we developed a projection lithography simulator which was included inside the optimization loop. This method was applied to the design of a 1-dimensional distributed Bragg mirror

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ePlXnet is a Network of Excellence with a focus on photonic integrated circuits. Its objective is to serve the academic and industrial research community by building a world-class research infrastructure and to make it accessible. This is done through the creation of technology platforms. Introductionstimulate new opportunities for photonic integration in The integration of complex or high performance