Very high energy electrons (VHEE) in the range from 100-250 MeV have the potential of becoming an alternative modality in radiotherapy because of their improved dosimetry properties compared with MV photons from contemporary medical linear accelerators. Due to the need for accurate dosimetry of small field size VHEE beams we have performed dose measurements using EBT2 Gafchromic® film. Calibration of the film has been carried out for beams of two different energy ranges: 20 MeV and 165 MeV from conventional radio frequency linear accelerators. In addition, EBT2 film has been used for dose measurements with 135 MeV electron beams produced by a laser-plasma wakefield accelerator. The dose response measurements and percentage depth dose profiles have been compared with calculations carried out using the general-purpose FLUKA Monte Carlo (MC) radiation transport code. The impact of induced radioactivity on film response for VHEEs has been evaluated using the MC simulations. A neutron yield of the order of 10 −5 neutrons cm −2 per incident electron has been estimated and induced activity due to radionuclide production is found to have a negligible effect on total dose deposition and film response. Neutron and proton contribution to the equivalent doses are negligible for VHEE. The study demonstrates that EBT2 Gafchromic film is a reliable dosimeter that can be used for dosimetry of VHEE. The results indicate an energy-independent response of the dosimeter for 20 MeV and 165 MeV electron beams and has been found to be suitable for dosimetry of VHEE.

a b s t r a c tAt the SPARC_LAB facility of INFN-LNF we are installing a transport lines for ultra-short electron bunches and another for ultra-intense laser pulses, generated by the SPARC photo-injector and by the FLAME laser in a synchronized fashion at the tens of fs level, to co-propagate inside a hydrogen filled glass capillary, in order to perform acceleration of the electron bunch by a plasma wave driven by the laser pulse. The main aim of this experiment is to demonstrate that a high brightness electron beam can be accelerated by a plasma wave without any significant degradation of its quality. Motivations of the technical choices are made and expected performances are reported.

In a recent paper, a scheme for inserting and extracting high brightness electron beams to/from a plasma based acceleration stage was presented and proved to be effective with an ideal bi-Gaussian beam, as could be delivered by a conventional photo-injector. In this paper, we extend that study, assessing the method stability against some jitters in the properties of the injected beam. We find that the effects of jitters in Twiss parameters are not symmetric in results; we find a promising configuration that yields better performances than the setting proposed in [14]. Moreover we show and interpret what happens when the beam charge profiles are modifie

No abstract