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Lead sulfide thin films were grown by means of chemical bath deposition using thermostatically controlled conditions, microwave and ultrasonic irradiation. The film was characterized by means of XRD, SEM and EDX methods. According to XRD deposited film has a cubic structure of PbS. SEM confirmed nanosize nature of thin film that depend on deposition conditions. The dark resistance and photosensitivity of PbS film is shown to correlate with deposition time, concentration of ammonium iodide in reaction mixture, ultrasound and microwave influences.