Aperiodic one-dimensional Si∕SiO2 Thue–Morse (T–M) multilayer structures have been fabricated in order to investigate both the band gap properties with respect to the system size (band gap scaling) and the omnidirectional reflectance at the fundamental optical band gap. Variable angle reflectance data have experimentally demonstrated a large reflectance band gap in the optical spectrum of a T–M quasicrystal, in agreement with transfer matrix simulations. We explain the physical origin of the T–M omnidirectional band gap as a result of periodic spatial correlations in the complex T–M structure. The unprecedented degree of structural flexibility of T–M systems can provide an attractive alternative to photonic crystals for the fabrication of photonic devices.
Mach-Zehnder electro-optic waveguide modulators were fabricated based on BaTiO 3 ͑BTO͒-SrTiO 3 ͑STO͒ multilayer thin film stacks grown on single crystal MgO substrates by pulsed laser deposition. X-ray diffraction measurements confirmed the formation of a BTO-STO superlattice with periodicity of 11 unit cells. Strip-loaded waveguides were formed by patterning a Si x N y film deposited onto the BTO-STO stack while Al electrodes of 3 mm length and 13 m separation were fabricated in the vicinity of the active waveguide arm of the Mach-Zehnder modulator. An effective electro-optic coefficient of 73 pm/ V at 1550 nm wavelength was determined for the deposited BTO-STO superlattice by measuring the output intensity as a function of applied electric field.
The crystallographic properties of BaTiO 3 thin films, grown by pulsed laser deposition on MgO substrates, were found to be strongly influenced by the oxygen pressure used during growth. Low pressure grown films were c-oriented while increasing oxygen pressure produced films with preferred a-orientation. The crystal reorientation resulted in the shift of optical birefringence from +0.04 to −0.025 with low levels of birefringence in films possessing low tetragonal distortion. Mach-Zehnder electro-optic waveguide modulators were fabricated to characterize the electro-optic properties of the deposited films and to evaluate the suitability of these films for planar optical applications. An effective electro-optic coefficient of 23 pm/V was obtained for a c-axis oriented film near the crystal c→a reorientation point.
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