Using a blister test, we measured
the work of separation
between
MoS2 membranes from metal, semiconductor, and graphite
substrates. We found a work of separation ranging from 0.11 ±
0.05 J/m2 for chromium to 0.39 ± 0.1 J/m2 for graphite substrates. In addition, we measured the work of adhesion
of MoS2 membranes over these substrates and observed a
dramatic difference between the work of separation and adhesion, which
we attribute to adhesion hysteresis. Due to the prominent role that
adhesive forces play in the fabrication and functionality of devices
made from 2D materials, an experimental determination of the work
of separation and adhesion as provided here will help guide their
development.
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