Nitride films are grown on Ti, Ta, Mo, W, Ni, Si(111), and NaCl(100) substrates by ion implantation, and their phase composition, structure, and properties are studied. The films produced using a titanium target are multiphase and contain, in addition to TiN and Ti 2 N (and minor amounts of nitrides of the substrate metal), TiO 2 and oxides of the substrate metal in the form of islands 0.04 to 0.2 µ m in size, distributed at random over the film. The presence of several phases in the films determines their mechanical and electrical properties and ensures good adhesion and corrosion resistance.

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