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Silicon nitride nanofibers coated with titanium nitride particles are formed by deposition of TiO(OH) 2 and Ti(O) 2 (OH) 2 using controlled hydrolysis of TiCl 4 followed by nitriding in an NH 3 flow. The nitriding at 700-900 °C permits the formation of 5 to 15 nm titanium nitride particles. The amorphous layer on Si 3 N 4 fibers limits the nucleation of titanium nitride and thus the formation of continuous coatings. Titanium peroxyhydroxide Ti(O) 2 (OH) 2 as a precursor is preferable for depositing titanium nitride coatings on silicon nitride fibers.

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