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The characteristics of diamond-like carbon (DLC)ˆlms deposited by high power impulse magnetron sputtering (HiPIMS) with multipolar magnetic plasma conˆnement (MMPC) were investigated. DLCˆlms were prepared on silicon (Si) by HiPIMS and HiP-IMS MMPC over varying substrate bias voltage. Depositions were performed from a graphite target (210 mm in diameter) under argon (Ar) gas atmosphere at chamber pressure of 0.5 Pa. The DLCˆlms were analyzed by several methods. In HiPIMS MMPC, the peak power density was approximately 690 W/cm 2 at a duty cycle of 1 (frequency: 200 Hz). According to Raman spectroscopy, the structure of DLCˆlm deposited by HiPIMS MMPC could be changed from amorphous carbon (a C) to tetrahedral amorphous carbon (ta C). The deposition rate in HiPIMS MMPC was approximately 50 (10 nm/min) lower than that in HiPIMS. However, HiP-IMS MMPC is considered as one of the eŠective methods to prepare hard and dense DLCˆlms (20 GPa and 2.00 g/cm 3 at the maximum). . は じ め に

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