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Plasma enhanced CVD of vanadium carbides and oxides is reported for the first time. Vanadium carbide and vanadium oxides are of technological interest for hard coatings (VC1–x), storage media (VO2), and smart electrochromic windows (V2O5), and until now have been prepared mainly by physical deposition methods. The advantages of the precursor vanadocene are outlined and the influence of experimental parameters such as the hydrogen flow rate and the substrate temperature on the composition and resistivity of the films described.

Tricarbonyl(tetramethylcyclobutadiene)cobalt hexafluorophosphate (III), prepared as shown, is converted into the neutral complex (VIII) and the iodide (V).