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In this paper an atomic force microscopy analysis of the microrough upper boundaries of ZrO 2 and HfO 2 thin films is presented. Within this analysis the values of the width, root-mean-square value of heights and power spectral density function of these boundaries are determined for ZrO 2 and HfO 2 exhibiting different thicknesses. The thickness dependences of the quantities mentioned are introduced. The values of the thicknesses of the films are evaluated using the combined optical method. This optical method is also used to describe boundary microroughness within the effective medium theory. A discussion of the results concerning the microroughness of the upper boundaries of both the ZrO 2 and HfO 2 thin films is also introduced.

In this paper results concerning the complete optical analysis of inhomogeneous ZrO 2 films are introduced. The optical analysis of these films is carried out using the combined optical method based on interpreting experimental data corresponding to variable angle of incidence spectroscopic ellipsometry (VASE) and near-normal incidence spectroscopic reflectometry (NNSR). The model of the ZrO 2 films used for interpretation of the experimental data achieved using the combined method exhibits a continuous refractive index profile. It is shown that this model is satisfactory for treating the experimental data. Further, it is shown that all the parameters characterizing the model mentioned can be determined with high accuracy. By means of atomic force microscopy (AFM) it is found that the upper boundaries of the inhomogeneous ZrO 2 films are slightly rough. The values of the basic statistical quantities characterizing this boundary roughness are evaluated using the AFM data. The optical inhomogeneity of the ZrO 2 films studied is explained by the columnar structure of these films.

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