Point defects in solids promise precise measurements of various quantities. Especially magnetic field sensing using the spin of point defects has been of great interest recently. When optical readout of spin states is used, point defects achieve optical magnetic imaging with high spatial resolution at ambient conditions. Here, we demonstrate that genuine optical vector magnetometry can be realized using the silicon vacancy in SiC, which has an uncommon S ¼ 3=2 spin. To this end, we develop and experimentally test sensing protocols based on a reference field approach combined with multifrequency spin excitation. Our work suggests that the silicon vacancy in an industry-friendly platform, SiC, has the potential for various magnetometry applications under ambient conditions.

Using medium- and high-resolution multi-spectra fitting of deep level transient spectroscopy (DLTS), minority carrier transient spectroscopy (MCTS), optical O-DLTS and optical-electrical (OE)-MCTS measurements, we show that the EH6∕7 deep level in 4H-SiC is composed of two strongly overlapping, two electron emission processes with thermal activation energies of 1.49 eV and 1.58 eV for EH6 and 1.48 eV and 1.66 eV for EH7. The electron emission peaks of EH7 completely overlap while the emission peaks of EH6 occur offset at slightly different temperatures in the spectra. OE-MCTS measurements of the hole capture cross section σp0(T) in p-type samples reveal a trap-Auger process, whereby hole capture into the defect occupied by two electrons leads to a recombination event and the ejection of the second electron into the conduction band. Values of the hole and electron capture cross sections σn(T) and σp(T) differ strongly due to the donor like nature of the deep levels and while all σn(T) have a negative temperature dependence, the σp(T) appear to be temperature independent. Average values at the DLTS measurement temperature (∼600 K) are σn2+(T) ≈ 1 × 10−14 cm2, σn+(T) ≈ 1 × 10−14 cm2, and σp0(T) ≈ 9 × 10−18 cm2 for EH6 and σn2+(T) ≈ 2 × 10−14 cm2, σn+(T) ≈ 2 × 10−14 cm2, σp0(T) ≈ 1 × 10−20 cm2 for EH7. Since EH7 has already been identified as a donor transition of the carbon vacancy, we propose that the EH6∕7 center in total represents the overlapping first and second donor transitions of the carbon vacancy defects on both inequivalent lattice sites.

The use of chlorinated chemical vapor deposition (CVD) chemistry for growth of homoepitaxial layers of silicon carbide (SiC) has diminished the problem of homogenous gas phase nucleation, mainly the formation of Si droplets, in CVD of SiC by replacing Si-Si bonds with stronger Si-Cl bonds. Employing the even stronger Si-F bond could potentially lead to an even more efficient CVD chemistry, however, fluorinated chemistry is very poorly understood for SiC CVD. Here, we present studies of the poorly understood fluorinated CVD chemistry for homoepitaxial SiC layers using SiF4 as Si precursor. We use a combination of experimental growth studies, thermal equilibrium calculations of gas phase composition and quantum chemical computations (i.e. hybrid density functional theory) of the surface chemistry to probe the silicon chemistry in the CVD process. We show that while growth rates on the order of 35 µm/h can be achieved with a fluorinated chemistry, the deposition chemistry is very sensitive to the mass flows of the precursors and not as robust as the chlorinated CVD chemistry which routinely yields 100 µm/h over wide conditions. By using the position for the onset of epitaxial growth along the gas flow direction as a measurable, together with modeling, we conclude that SiF is the main Si growth species with SiHF as a minor Si species contributing to growth.

become known to be very weak compared to the central line (CL) of this S = 3/2 center. Therefore, the V − Si center in hexagonal polytypes was believed to give rise to only one EPR line like the center in the cubic crystal 3C-SiC with no ZFS [3]. We refer to this defect as the no-ZFS V − Si center. Later optically detected magnetic resonance (ODMR) studies reported several ODMR centers with axial symmetry and small ZFS, labelled T V1a , T V2a , T V1b and T V2b , which were suggested to be related to the V1 and V2 photoluminescence (PL) lines at 1. 438 and 1.352 eV, respectively,. The absence of the CL in the ODMR spectra measured under resonant excitation led to the assignment of these centers to the isolated neutral Si vacancy (V 0 Si ) with spin S = 1 [4]. Two PL centers are expected for two possible configurations

Chemical Vapor Deposition (CVD) is one of the technology platforms forming the backbone of the semiconductor industry and is vital in the production of electronic devices. To upscale a CVD process from the lab to the fab, large area uniformity and high run-to-run reproducibility are needed. We show by a combination of experiments and gas phase kinetics modeling that the combinations of Si and C precursors with the most well-matched gas phase chemistry kinetics gives the largest area of of homoepitaxial growth of SiC. Comparing CH4, C2H4 and C3H8 as carbon precursors to the SiF4 silicon precursor, CH4 with the slowest kinetics renders the most robust CVD chemistry with large area epitaxial growth and low temperature sensitivity. We further show by quantum chemical modeling how the surface chemistry is impeded by the presence of F in the system which limits the amount of available surface sites for the C to adsorb.

Funding agencies: Knut & Alice Wallenberg Foundation (KAW) project Isotopic Control for Ultimate Material Properties; Swedish Foundation for Strategic Research project SiC - the Material for Energy-Saving Power Electronics [EM11-0034]; Swedish Government Strategic Research