Photodeprotection of N-octyloxybenzyl aromatic polyamide film containing photo acid generator (PAG) was investigated. The photodeprotection was proceeded well under UV irradiation (365 nm, 5 J/cm 2), followed by heating at 130 °C for 15 min in the presence of 25 wt% of PAG. Line pattern of 30 to 20 μm on Si wafer was obtained from the photosensitive film after dipping into acetone. It turned out that N-alkoxybenzyl aromatic polyamides serve as a new photosensitive material in the presence of PAG.

Effects of oxides (SiO2 and Al2O3) and Carbonate (CaCO3) on the reaction of hematite and carbon obtained by the mechanical milling were studied. The content of the additives were 3 mass%. The hematite contained the oxide or carbonate was mixed with graphite, and the ratio of hematite to carbon was 80 to 20. Ball milling (alumina ball and vessel) was carried out for 24 h under an argon atmosphere. The reaction rates were measured by TG-DTA and examined the effects of oxides and carbonate on the reaction rate.The main peak of reaction rate, which corresponds to the successive reaction of Fe3O4-FeO-Fe reduction, was located at 850°C for no-addition sample. When 3 mass% Al2O3 was added to the mixture of hematite and carbon, the temperature of main peak did not change. It was considered that since the vessel and balls were also made of alumina, the effect of alumina already existed in the no-addition sample. When 3 mass% SiO2 (reagent grade) was added to the mixture, the temperature of main peak was 1 000°C, which meant the retardation effect on the hematite and carbon reaction. On the other hand, 3 mass% CaCO3 addition promoted the reaction and the main peak was 790°C, which was about 60°C lower than that of no-addition. Using the results of quartz and CaO addition, the reaction mechanisms for the retardation effect of SiO2 and the acceleration effect of CaCO3 were considered.KEY WORDS: mechanical milling; effect of mineral matter; thermodynamic coupling.