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After depositing an ultra-thin metallic Tiˆlm by sputtering, we repeated the process of exposing the still active plasma gas for high-rate low-temperature deposition of a metal compoundˆlm, thereby successfully fabricating a thinˆlm of TiO 2 with photocatalytic properties. The TiO 2 thinˆlm produced using the present method exhibited approximately 15 times the deposition rate of DC reactive magnetron sputtering, yielding a crystalline structure using an unheated substrate (approximately 40°C).