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We investigated the effects of recovery schemes on the characteristics of GaN Schottky diodes damaged by inductively coupled Cl2/H2/normalAr/CH4 plasma etching. The recovery schemes included N2 plasma exposure, N2 plasma plus annealing at 600°C in N2, and annealing at 700°C in N2. Ga-deficient GaN surface layers were observed after etching the GaN, and the Ga/N stoichiometry at the surface was most strongly affected by the Cl2 flow rate among the process variables. The samples annealed at 700°C showed a clear improvement in diode characteristics and a complete restoration of the Ga/N ratio from ca. 0.87 to ca. 1.0 at the surface layers, as measured by Auger electron spectroscopy. For all other damage-recovery schemes, the samples showed no significant enhancement in diode characteristics and incomplete restoration of Ga/N stoichiometry at the surface layers. © 2001 The Electrochemical Society. All rights reserved.

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In this work, we have designed and fabricated the GaAs Gunn diodes for a 94 GHz waveguide voltage controlled oscillator (VCO) which is one of the important parts in a frequency modulated continuous wave (FMCW) radar application. For fabrication of the high power GaAs Gunn diodes, we adopted a graded gap injector which enhances the output power and conversion efficiency by effectively removing the dead-zone. We have measured RF characteristics of the fabricated GaAs Gunn diodes. The operating current, oscillation frequency, and output power of the fabricated GaAs Gunn diodes are presented as a function of the anode diameters. The operating current increases with anode diameters, whereas the oscillation frequency decreases. The higher oscillation frequency was obtained from 60 µm anode diameters of the fabricated Gunn GaAs diodes and higher power was obtained from 68 µm. Also, for application of the 94 GHz FMCW radar system, we have fabricated the 94 GHz waveguide VCO. From the fabricated GaAs Gunn diodes of anode diameter of 60 µm, we have obtained the improved VCO performance.